報告書: Discover the exceptional 2-inch sapphire wafer, made from high-purity monocrystalline Al2O3. With a diameter of 50.80mm and thickness of 430um, this A-plane (11-20) wafer offers unmatched hardness, thermal stability, and optical clarity. Ideal for LED manufacturing, semiconductors, and optical applications.
関連製品特性:
単結晶酸化アルミニウム(Al2O3)製、純度99.999%。
Exceptional hardness rating of 9 on the Mohs scale, ensuring scratch resistance.
High thermal stability with a melting point of 2040°C and low thermal expansion.
10^14 Ω*cmを超える抵抗率を持つ優れた電気絶縁特性。
Precisely polished to achieve surface roughness (Ra) of 0.8-1.2 um for superior optical performance.
2インチ直径でA平面 (11-20) の結晶学方向性で利用可能.
双面は高品質なアプリケーションのためにエピポリスされた表面で磨かれています
Customizable options include varying diameters, orientations, and surface finishes.
よくある質問:
How are sapphire wafers manufactured?
Sapphire wafers are produced using the Czochralski process, where a seed crystal is dipped into molten aluminium oxide and slowly pulled out while rotating to form a large boule, which is then sliced into thin wafers.
What are the environmental and safety considerations for sapphire wafer production?
Production involves high temperatures and energy consumption, requiring waste management and energy efficiency. Safety protocols are necessary due to high temperatures and material brittleness.