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Created with Pixso. High-Purity Sapphire Wafer for LED, Semiconductor, Laser, and Optical Devices

High-Purity Sapphire Wafer for LED, Semiconductor, Laser, and Optical Devices

ブランド名: ZMSH
モデル番号: 2インチから12インチまですべて利用可能
MOQ: 5
価格: by case
配達時間: 2~4週間
支払条件: T/T
詳細情報
起源の場所:
中国
起源の場所:
中国
材料:
99.999% Al2O3
業界:
導かれた、光学ガラス、eli準備ができたウエファー
応用:
Semicondutorのウエファー、導かれた破片、光学ガラスの窓、電子製陶術
色:
白くか赤くまたは青
視野ライト透過率:
85%
advantagement:
高いhardness9.0は、耐久性を
タイプ:
単結晶
パッケージの詳細:
窒素が付いている真空密封の容器はクラス100の環境で埋め戻す
製品の説明

Product Description

 

Our sapphire wafers are made of single crystal aluminum oxide (Al₂O₃) with a hexagonal lattice structure, commonly available in C-plane, A-plane, and R-plane orientations. With broad optical transparency from near-ultraviolet (190 nm) to mid-infrared, these wafers are ideal for optical components, infrared devices, high-strength laser windows, and mask materials. Sapphire’s high hardness, thermal stability, corrosion resistance, high melting point (2045°C), and excellent transparency make it a reliable material for demanding applications, though it requires precision processing.

For LED manufacturing, sapphire wafers are essential for high-quality GaN epitaxial growth, as their surface processing directly affects the brightness and uniformity of white, blue, and green LEDs. The minimal lattice mismatch between sapphire C-plane substrates and III-V/II-VI thin films ensures excellent alignment with high-temperature epitaxy processes, making sapphire wafers indispensable for advanced optoelectronic devices.

 

        High-Purity Sapphire Wafer for LED, Semiconductor, Laser, and Optical Devices 0      High-Purity Sapphire Wafer for LED, Semiconductor, Laser, and Optical Devices 1       High-Purity Sapphire Wafer for LED, Semiconductor, Laser, and Optical Devices 2       High-Purity Sapphire Wafer for LED, Semiconductor, Laser, and Optical Devices 3